한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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- Pages.229-230
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- 2008
RF magnetron sputtering 기술로 증착한 Undoped ZnO 박막의 증착 압력에 따른 구조적, 광학적 특성
The Structural and Optical Properties of Undoped ZnO Thin Films Deposited by RF Magentron Sputtering System as Functions of Working Pressures
- Kim, Jae-Cheon (Dept. of Semiconductor-display Engineering, Hoseo University) ;
- Kim, Myung-Chun (Dept. of Advanced Materials Engineering Hoseo University) ;
- Kim, Jwa-Yeon (Dept. of Advanced Materials Engineering Hoseo University)
- 발행 : 2008.11.06
초록
We have studied the structural and optical properties of ZnO thin film deposited on glass by RF magnetron sputtering as functions of working pressures. The grain sizes were decreased as the working pressures were increased. The average optical transmissions over all exceeded 80% for ZnO films deposited in 20, 25 and 300m torr working pressures. And the transmission spectra patterns were almost same. While the transmission spectra pattern of ZnO film deposited in 35nm torr was different with other spectra patterns obtained in 20, 25 and 30nm torr working pressures.