Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2008.11a
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- Pages.149-149
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- 2008
Ru and $RuO_2$ Thin Films Grown by Atomic Layer Deposition
- Shin, Woong-Chul (NCD technology) ;
- Choi, Kyu-Jeong (NCD technology) ;
- Jung, Hyun-June (School of Nano Science and Engineering, Chungnam National University) ;
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Yoon, Soon-Gil
(School of Nano Science and Engineering, Chungnam National University) ;
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Kim, Soo-Hyun
(School of Materials Science and Engineering, Yeungnam University)
- Published : 2008.11.06
Abstract
Metal-Insulator-Metal(MIM) capacitors have been studied extensively for next generation of high-density dynamic random access memory (DRAM) devices. Of several candidates for metal electrodes, Ru or its conducting oxide