한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2008년도 International Meeting on Information Display
- /
- Pages.989-992
- /
- 2008
Material Design for the Fabrication of Barrier Ribs with High Aspect Ratio of Plasma Display Panel by X-ray Lithography
- Ryu, Seung-Min (Sch. of Mechanical Engineering & Aerospace System, KAIST) ;
- Yang, Dong-Yol (Sch. of Mechanical Engineering & Aerospace System, KAIST) ;
- So, Jae-Yong (Dept. of Polymer Science, Kyungpook Nat. Univ.) ;
- Park, Lee-Soon (Dept. of Polymer Science, Kyungpook Nat. Univ.)
- 발행 : 2008.10.13
초록
X-ray lithography is one of the most powerful processes in the fabrication of nano/micro structures with a high aspect ratio. This process enables the fabrication of ultra-thin barrier ribs for PDP using X-ray sensitive paste. In this paper, organic material including photo-monomers, photo-oligomers, binder polymer and additives as well as inorganic powders with different size were optimized to fabricate high aspect ratio barrier rib pattern for PDP.