한국정보디스플레이학회:학술대회논문집
- 2008.10a
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- Pages.543-544
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- 2008
Study of Plasma Process Induced Damages on Metal Oxides as Buffer Layer for Inverted Top Emission Organic Light Emitting Diodes
- Kim, Joo-Hyung (Dept. of Display and Semiconductor Physics, Korea University) ;
- Lee, You-Jong (Dept. of Display and Semiconductor Physics, Korea University) ;
- Jang, Jin-Nyoung (Dept. of Display and Semiconductor Physics, Korea University) ;
- Song, Byoung-Chul (Dept. of Display and Semiconductor Physics, Korea University) ;
- Hong, Mun-Pyo (Dept. of Display and Semiconductor Physics, Korea University)
- Published : 2008.10.13
Abstract
In the fabrication of inverted top emission organic light emitting diodes (ITOLEDs), the organic layers are damaged by high-energy plasma sputtering process for transparent top anode. In this study, the plasma process induced damages on metal oxide hole injection layers (HILs) including