TFT-LCD Display Quality Improvement by the Adjustment of Gate Line Structure

  • Zhang, Mi (Beijing BOE Optoelectronics Technology CO., LTD) ;
  • Xue, Jian She (Beijing BOE Optoelectronics Technology CO., LTD) ;
  • Park, Chun-Bae (Beijing BOE Optoelectronics Technology CO., LTD) ;
  • Koh, Jai-Wan (Beijing BOE Optoelectronics Technology CO., LTD) ;
  • Zhang, Zhi-Min (Institute of Computing Technology of the Chinese Academy of Sciences)
  • Published : 2008.10.13

Abstract

Too high stress of the bottom Mo layer of the gate line is thought to be the main reason for H-line mura. H-Line mura is eliminated effectively by changing the gate line metal structure from Mo/AlNd/Mo to AlNd/Mo. The new structure does not influence the panel's electrical characteristics.

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