Proceedings of the Korean Society Of Semiconductor Equipment Technology (한국반도체및디스플레이장비학회:학술대회논문집)
- 2008.05a
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- Pages.23-29
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- 2008
ADP DRY ETCHER TECHNOLOGY
ADP Dry Etcher 장비개발의 현황
Abstract
- High Density Plasma Source-CCP-Dual/Triple, RF Frequency Control - Radical/Flux Analysis - Low Pressure Process - Chamber Design (Process gap/Wall gap) - Chamber Temp. Control. - ESC Dielectric Materials - Uniform Gas Injection
Keywords