UV nano imprint 공정에서 air bubble area 최소화에 대한 연구

Experimental study to minimize the air bubble during the imprinting process in UV nanoimprint lithography

  • 최성웅 (서울대학교 기계항공공학부 대학원) ;
  • 이동언 (서울대학교 기계항공공학부) ;
  • 이우일 (서울대학교 기계항공공학부)
  • 발행 : 2008.11.05

초록

Formation of air bubble is the one of common defects in UV nano imprint lithography. Location of dispensing and volume of droplets are among the most important parameters in the process. ]n this study, UV curable resin droplets with different volumes were dispensed at different locations and pressed to investigate air bubble formation. By varying volume of droplet and dispensing location, process conditions were found for minimum air bubble area.

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