Thickness effect of a Ge interlayer on the formation of nickel silicides
-
Choe, Cheol-Jong
(IT Convergence Technology Research Division, Electronics and Telecommunications Research Institute (ETRI)) ;
- Jang, Seo-Yong (Materials Engineering Group, Korea Electric Power Research Institute (KEPRI)) ;
- Lee, Seong-Jae (Department of Physics, Hanyang University) ;
- Ok, Yeong-U (Department of Materials Science and Engineering, Korea University) ;
-
Seong, Tae-Yeon
(Department of Materials Science and Engineering, Korea University)
- Published : 2007.05.31
Abstract
Keywords