한국표면공학회:학술대회논문집 (Proceedings of the Korean Institute of Surface Engineering Conference)
- 한국표면공학회 2007년도 추계학술대회 논문집
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- Pages.118-119
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- 2007
Phase stability and Morphology of high-k gate stack of $Si/SiO_2/HfO_2$ and $Si/SiO_2/ZrO_2$
- Lee, Seung-Hwan (SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University) ;
- Bobade, Santosh M. (SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University) ;
- Yoo, W.J. (SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University)
- 발행 : 2007.11.12
초록
Phase stability and morphological investigation on the
키워드