Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2007.11a
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- Pages.118-119
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- 2007
Phase stability and Morphology of high-k gate stack of $Si/SiO_2/HfO_2$ and $Si/SiO_2/ZrO_2$
- Lee, Seung-Hwan (SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University) ;
- Bobade, Santosh M. (SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University) ;
- Yoo, W.J. (SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University)
- Published : 2007.11.12
Abstract
Phase stability and morphological investigation on the
Keywords