A Study on the Characteristics of Low Dielectric Constant SiOC(-H) Films Deposited with Various Substrate Temperature

  • Kim, Seung-Hyun (Nano Thin film Material Laboratory, Department of Physics, Cheju National University) ;
  • Kim, Chang-Young (Nano Thin film Material Laboratory, Department of Physics, Cheju National University) ;
  • Navamathavan, R. (Nano Thin film Material Laboratory, Department of Physics, Cheju National University) ;
  • Choi, Chi-Kyu (Nano Thin film Material Laboratory, Department of Physics, Cheju National University)
  • 발행 : 2007.08.15