The Research of RGB Photo Resistant In the Ink-Jet System

  • Huang, Chi-Yuan (Dept. of Material Engineering, Tatung University) ;
  • Liu, Chia-I (Dept. of Material Engineering, Tatung University) ;
  • Tsao, Keng-Yu (Dept. of Material Engineering, Tatung University) ;
  • Kuo, Ju-Chien (Dept. of Material Engineering, Tatung University) ;
  • Wu, Jing-Yi (Dept. of Material Engineering, Tatung University) ;
  • Lo, Yu-Cheng (Central Research Institute, Chunghwa Picture Tubes, Ltd.) ;
  • Liu, Pei-Yu (Central Research Institute, Chunghwa Picture Tubes, Ltd.) ;
  • Wang, Jiun-Ming (Central Research Institute, Chunghwa Picture Tubes, Ltd.) ;
  • Li, Huai-An (Central Research Institute, Chunghwa Picture Tubes, Ltd.)
  • Published : 2007.08.27

Abstract

The purpose of this research is to control proper processing condition of RGB photo resistant in the ink-jet process increasing processing ability by adding additives. The viscosities of modified RGB photo resistant were $10{\sim}14cps$ and the additives could decreased agglomeration and flowing trace of photo resistant effectively. Another way, the adhesion between photo resistant and glass substrate was improved by modifying photo resistant and substrate. The surface tensions of modified photo resistant were same as that of original RGB photo resistant. The additives appeared a better compatibility with photo resistant, and the micelle of photo resistant did not be broken during modified process.

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