The Effect on Electrical Property of Etched Magnetic Tunnel Junction Stack in $Cl_{2}/Ar\;and\;HBr/Ar\;plasma$

  • Min, Su-Ryun (Department of Chemical Engineering, INHA University) ;
  • Cho, Han-Na (Department of Chemical Engineering, INHA University) ;
  • Choi, Seung-Pil (Department of Chemical Engineering, INHA University) ;
  • Hwang, In-Jun (Semiconductor Device and Material Lab., Samsung Advanced Institute of Technology) ;
  • Kim, Kee-Won (Semiconductor Device and Material Lab., Samsung Advanced Institute of Technology) ;
  • Chung, Chee-Won (Department of Chemical Engineering, INHA University)
  • 발행 : 2007.05.28