Characteristics of W-C-N thin films on Si as a role of Diffusion Barrier for $La_{0.67}Sr_{0.33}MnO_{3}$ manganese oxide layer

  • Kim, Soo-In (Nano & Electronic Physics, Kookmin University) ;
  • Kim, Yong-Tae (Semiconductor Materials and Devices Lab., Korea Institute of Science & Technology) ;
  • Lee, Chang-Woo (Nano & Electronic Physics, Kookmin University)
  • Published : 2007.05.28