Etch Characteristics of Magnetic Tunnel Junction Stack Using a High Density Plasma in a HBr/Ar Gas

  • Min, Su-Ryun (Department of Chemical Engineering, INHA University) ;
  • Choi, Han-Na (Department of Chemical Engineering, INHA University) ;
  • Choi, Seung-Pil (Department of Chemical Engineering, INHA University) ;
  • Kim, Jung-Seung (Nano-device Research Center, Korea Institute of Science and Technology) ;
  • Shin, Kyung-Ho (Nano-device Research Center, Korea Institute of Science and Technology) ;
  • Chung, Chee-Won (Department of Chemical Engineering, INHA University)
  • Published : 2007.05.28