한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2007년도 제32회 학술대회 초록집
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- Pages.88-88
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- 2007
Etching characteristics of DLC-hard mask using dual frequency superimposed capacitively coupled plasmas (DFS-CCP)
- Kim, H.T. (School of Advanced Materials Science and Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Kwon, B.S. (School of Advanced Materials Science and Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Lee, N.E. (School of Advanced Materials Science and Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Cho, H.J. (School of Information and Communication Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Hong, B.Y. (School of Information and Communication Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University)
- 발행 : 2007.02.06