Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Fabrication of 2-D photonic crystal with holographic lithography

홀로그램피 리소그래피 방법을 이용한 2차원 포토닉 크리스탈 제작

  • Ju, Long-Yun (Dept. of Electronic Materials Eng. Kwangwoon Univ.) ;
  • Nam, Ki-Hyun (Dept. of Electronic Materials Eng. Kwangwoon Univ.) ;
  • Kim, Hyun-Koo (Dept. of Electronic Materials Eng. Kwangwoon Univ.) ;
  • Choi, Hyuk (Dept. of Electronic Materials Eng. Kwangwoon Univ.) ;
  • Chung, Hong-Bay (Dept. of Electronic Materials Eng. Kwangwoon Univ.)
  • 구용운 (광운대학교 전자재료공학과) ;
  • 남기현 (광운대학교 전자재료공학과) ;
  • 김현구 (광운대학교 전자재료공학과) ;
  • 최혁 (광운대학교 전자재료공학과) ;
  • 정홍배 (광운대학교 전자재료공학과)
  • Published : 2007.11.01
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Abstract

In this paper, we fabrication of 2-D photonic crytal using holographic lithography. We used Ag doped chalcogenide AsGeSeS film and He-Ne (632.8nm) (P:P) Polarized laser beam. The thickness of Ag thin film was varied from 60nm and the thickness of chalcogenide thin film was varied from 2um. Frist, holographic lithography with 1-D photonic crystal on Ag/AsGeSeS film. And than revolved the sample $90^{\circ}$ to fabricate 2-D photonic crystal with holographic lithography.

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