한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2007년도 추계학술대회 논문집
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- Pages.65-65
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- 2007
CMP 공정을 통한 표면 특성 개선에 의한 $CeO_2$ 산소 센서 감도 향상 연구
Sensitivity improvement of $CeO_2$ oxygen sensor by betterment of surface characteristics through chemical mechanical polishing process
- Jung, Pan-Gum (Chosun Univ.) ;
- Jun, Young-Kil (Chosun Univ.) ;
- Ko, Pil-Ju (Chosun Univ.) ;
- Kim, Nam-Hoon (Sungkyunkwan Univ.) ;
- Lee, Woo-Sun (Chosun Univ.)
- 발행 : 2007.11.01
초록
Microstructure and surface roughness of the sensing materials should be improved to use them in advanced sensor applications because the uneven surface roughness degrades the light reflection, pattern resolution, and devices performance. Chemical mechanical polishing (CMP) processing was selected for improving the surface roughness of