Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2006.08a
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- Pages.88-88
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- 2006
Reliable Thickness Measurement of Ultra-thin SiO2 films using XPS by Precise Setting of the Surface Normal
- Kim Kyung-Joong (Division of Advanced Technology, Korea Research Institute of Standards and Science) ;
- Moon Dae-Won (Division of Advanced Technology, Korea Research Institute of Standards and Science)
- Published : 2006.08.01
Abstract
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