Controlled Wall Thickness of $Cu/Al_2O_3$ Nanocables by Using Atomic Layer Deposition and Electrodeposition

  • Kang Moon-C. (Department of Chemistry, Kookmin University) ;
  • Hwang Jae-K. (Department of Chemistry, Kookmin University) ;
  • Sung Myung-M. (Department of Chemistry, Kookmin University)
  • Published : 2006.02.01