Preparation of NiO thin films by MOCVD using new liquid aminoalkoxide Ni precursor, $Ni(dmamb)_2$ and their resistance switching phenomena

Min Kyung-Chul (Thin Film Materials Lab., Korea Research Institute of Chemical Technology) ;
Lee Young-Kuk (Thin Film Materials Lab., Korea Research Institute of Chemical Technology) ;
An Ki-Seok (Thin Film Materials Lab., Korea Research Institute of Chemical Technology) ;
Lee Sun-Sook (Thin Film Materials Lab., Korea Research Institute of Chemical Technology) ;
Chung Taek-Mo (Thin Film Materials Lab., Korea Research Institute of Chemical Technology) ;
Kim Chang-Gyoun (Thin Film Materials Lab., Korea Research Institute of Chemical Technology) ;
Lee Nam-Soo (Department of Chemistry, Chungbuk National University) ;
Kim Yun-Soo (Thin Film Materials Lab., Korea Research Institute of Chemical Technology)