Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2006.04a
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- Pages.133-133
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- 2006
Infinite etch selectivity of silicon nitride to ArF PR in dual-frequency $CH_2F_2/H_2/Ar$ capacitively coupled plasmas
Dual-frequency $CH_2F_2/H_2/Ar$ capacitively coupled plasma 에서 실리콘 나이트라이드와 ArF PR의 무한대 에치 선택비
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