Thin Film Passivation of Organic Light Emitting Diodes by Catalyzer Enhanced Chemical Vapor Deposition (CECVD)

촉매반응 화학기상증착법을 이용한 유기발광소자의 박막 봉지

  • Kim, Han-Ki (Kumoh National Institute of Technology (KIT)) ;
  • Moon, J.M. (Kumoh National Institute of Technology (KIT)) ;
  • Bae, J.H. (Kumoh National Institute of Technology (KIT)) ;
  • Jeong, S.W. (Kumoh National Institute of Technology (KIT)) ;
  • Kim, M.S. (SAMSUNG SDI.)
  • Published : 2006.06.22

Abstract

We report on plasma damage free chemical vapor deposition technique for the thin film passivation of organic light emitting diodes (OLEDs), organic thin film transistor (OTFT) and flexible displays using catalyzer enhanced chemical vapor deposition (CECVD). Specially designed CECVD system has a ladder-shaped tungsten catalyzer and movable electrostatic chuck for low temperature deposition process. The top emitting OLED with thin film $SiN_x$ passivation layer shows electrical and optical characteristics comparable to those of the OLED with glass encapsulation. This indicates that the CECVD technique is a promising candidate to grow high-quality thin film passivation layer on OLED, OTFT, and flexible displays.

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