Measurement of Secondary Electron Emission Coefficient on Deposition Time of the Silicon Thin Films

실리콘박막의 증착시간에 따른 감마계수 측정법 개발

  • Lee, Jung-Hui (Division of Electronics and Information, Chonbuk National University) ;
  • Choi, Byoung-Jung (Division of Electronics and Information, Chonbuk National University) ;
  • Yang, Sung-Chae (Division of Electronics and Information, Chonbuk National University)
  • 이중휘 (전북대학교 전자정보공학부 전기공학과) ;
  • 최병정 (전북대학교 전자정보공학부 전기공학과) ;
  • 양성채 (전북대학교 전자정보공학부 전기공학과)
  • Published : 2006.11.09

Abstract

Recently, plasma display panels (PDPs) are highlighted for the flat type display device. Therefore, much attention has been paid to secondary electron emission coefficient of the electrode protective material of PDPs. As PDPs is developing, the concern about secondary electron emission coefficient ($\gamma$) which is related with PDPs electrode protection material is increasing continually. So the concern about the way to how to measure secondary electron emission coefficient is on the rise. At present, the way to how to measure secondary electron emission coefficient is developed by some research groups, which is giving some research part's advance help. In this research, we have studied how to measure secondary electron emission coefficient which is related with various thin films more conveniently than previous measurement method. We studied the method of measurement of secondary electron emission coefficient (${\gamma}$) of amorphous silicon films by using Paschen's curve.

Keywords