한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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- Pages.647-650
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- 2006
Laser Thermal Processing System for Creation of Low Temperature Polycrystalline Silicon using High Power DPSS Laser and Excimer Laser
- Kim, Doh-Hoon (Advanced Optical Equipment Division, Kornic Systems Co. Ltd.) ;
- Kim, Dae-Jin (Advanced Optical Equipment Division, Kornic Systems Co. Ltd.)
- 발행 : 2006.08.22
초록
Low temperature polycrystalline silicon (LTPS) technology using a high power laser have been widely applied to thin film transistors (TFTs) for liquid crystal, organic light emitting diode (OLED) display, driver circuit for system on glass (SOG) and static random access memory (SRAM). Recently, the semiconductor industry is continuing its quest to create even more powerful CPU and memory chips. This requires increasing of individual device speed through the continual reduction of the minimum size of device features and increasing of device density on the chip. Moreover, the flat panel display industry also need to be brighter, with richer more vivid color, wider viewing angle, have faster video capability and be more durable at lower cost. Kornic Systems Co., Ltd. developed the
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