Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2006.10a
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- Pages.117-118
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- 2006
The etching of $HfO_2$ thin film as the ion energy distributions in the $BCl_3/Ar$ inductively coupled plasma system
$BCl_3/Ar$ 유도 결합 플라즈마 시스템해서 이온 에너지 분포에 따른$HfO_2$ 박막 식각
Abstract
In this work, we investigated etching characteristics of
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