대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
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- Pages.85-86
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- 2006
$ZrO_2$ - DSS의 CMP 특성에 관한 연구
A Study on the Oxide CMP Characteristics using $ZrO_2$ -Diluted Silica Slurry($ZrO_2$ -DSS)
- Lee, Sung-Il (Daebul University) ;
- Park, Sung-Woo (Daebul University) ;
- Lee, Woo-Sun (Chosun University) ;
- Seo, Yong-Jin (Daebul University)
- 발행 : 2006.10.27
초록
Chemical mechanical polishing (CMP) technology has been widely used for global planarization of multi-level interconnection for ULSI applications. However, the cost of ownership and cost of consumables arc relatively high because of expensive slurry. In this paper, in order to save the costs of slurry, the original silica slurry was diluted by de-ionized water (DIW). And then,
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