Proceedings of the Polymer Society of Korea Conference (한국고분자학회:학술대회논문집)

The Polymer Society of Korea (한국고분자학회)
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Orientation of Poly(styrene-b-methylmethacrylate) thin films deposited on Self-Assembled Monolayers of phenylsilanes

  • Kim, Rae-Hyun (School of Chemical and Biological Engineering, Seoul National University, NANO Systems Institute-National Core Research Center) ;
  • Bulliard, Xavier (School of Chemical and Biological Engineering, Seoul National University, NANO Systems Institute-National Core Research Center) ;
  • Char, Kook-Heon (School of Chemical and Biological Engineering, Seoul National University, NANO Systems Institute-National Core Research Center)
  • Published : 2006.10.13
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Abstract

The morphology of Poly(styrene-b-methylmethacrylate) (P(S-b-MMA)) block copolymer thin films deposited on silicon wafers was controlled by treating the substrates with Self-Assembled Monolayers (SAM) of phenylsilanes with different alkyl chain lengths. It was found that the treatment with SAM strongly modified the substrates properties, especillay the surface energy, as compared with bare silicon oxide. By futher adjusting the molecular weight of P(S-b-MMA), a variety of morphologies could be generated, including a perpendicular orientation of lamellea of PS and PMMA, which is required for industrial applications.

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