Nanostructure formation in thin films of block copolymers prepared by controlled radical polymerization

Orthogonally protected block copolymers of based on p-hydroxystyrene were prepared with high control via nitroxy mediated radical polymerization using an alkoxyamine as an unimolecular initiator. Thin films of partially protected block copolymer were prepared by spin or dip coating. A well defined nanostructure could be observed as a result of phase separation e.g. cylinders in a matrix oriented perpendicular or parallel to the substrate. The nanostructure of the polymeric films can be defined by the block copolymer composition and it determines surface properties and allows further, selective functionalization, e.g. via click chemistry. The thin films can be designed in a way to allow a patterning based on a thermal or photochemical stimulus.