Proceedings of the Polymer Society of Korea Conference (한국고분자학회:학술대회논문집)

The Polymer Society of Korea (한국고분자학회)
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Materials for Step and Flash Imprint Lithography

  • Willson C. Grant (Department of Chemical Engineering, The University of Texas) ;
  • Hao Jianjun (Department of Chemical Engineering, The University of Texas) ;
  • Stewart Michael (Department of Chemical Engineering, The University of Texas) ;
  • Nishimura Yukio (Department of Chemical Engineering, The University of Texas) ;
  • Palmieri Frank (Department of Chemical Engineering, The University of Texas) ;
  • Jen Wei-Lun (Department of Chemical Engineering, The University of Texas) ;
  • Dickey Michael (Department of Chemical Engineering, The University of Texas) ;
  • Chan, Andrew (Department of Chemical Engineering, The University of Texas) ;
  • Wu Kai (Department of Chemical Engineering, The University of Texas) ;
  • Ekerdt John (Department of Chemical Engineering, The University of Texas) ;
  • Owens Jordan (The Advanced Technology Development Facility, 2706 Montopolis Drive) ;
  • Wetzel Jeffery T. (The Advanced Technology Development Facility, 2706 Montopolis Drive)
  • Published : 2006.10.13
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Abstract

Step and Flash Imprint Lithography is an interesting low cost alternative to traditional microlithographic processes that offers the ability to efficiently produce nanostructures at unprecedented resolution. New photopolymerizable formulations are required to enable this process. This paper will describe progress in the design and development of acrylate and vinyl ether based platforms for this application together with efforts to prepare photopolymerizable, thermally stable, magterials with low dielectric constants for use in an efficient new method for fabricating the interconnect structures in microprocessors.

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