A study on Calculating the Resistance characteristics analysis on Three-Dimensional Structure Using Computer Simulation Method.

컴퓨터 시뮬레이션을 이용한 3차원적 구조에서의 저항 특성 분석에 관한 연구

By now, we have been analysing the resistance values on 3 dimensional structure using experimental statical method or theoretical modeling, while devices miniaturizing reveals the limitation of the traditional methods to calculate 3 dimensional resistance. In addition, 2 dimensional analysing can not produce 3 dimensional characteristic following miniaturizing. To solve the limitations , we must do high level modeling of semi-conductor process. In this thesis, we analyzed the Laplace equation that is the basic and important for 3 dimensional structure resistance with computer simulation method and on the basis of this, analyzed the characteristic of resistance of 3 dimensional structure communication semiconductor device.