한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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- Pages.29-30
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- 2005
고압의 수소 및 중수소 분위기에서 열처리된 실리콘 산화막의 전기적 특성 관찰
Electrical Characteristics of Ultra-thin $SiO_2$ Films experienced Hydrogen or Deuterium High-pressure Annealing
- Lee, Jae-Sung (Uiduk Univ.) ;
- Baek, Jong-Mu (Daewon Science College) ;
- Do, Seung-Woo (Kyungpook National Univ.) ;
- Jang, Cheol-Yeong (Kyungpook National Univ.) ;
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Lee, Yong-Hyun
(Kyungpook National Univ.)
- 발행 : 2005.07.07
초록
Experimental results are presented for the degradation of 3 nm-thick gate oxide (