한국정보디스플레이학회:학술대회논문집
- 2005.07b
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- Pages.1123-1126
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- 2005
Enhanced LTPS Manufacturing Equipment employing Excimer Laser Crystallization
- Herbst, Ludolf (Lambda Physik AG) ;
- Simon, Frank (Lambda Physik AG) ;
- Rebhan, Ulrich (Lambda Physik AG) ;
- Geuking, Thorsten (Lambda Physik AG) ;
- Klaft, Ingo (Lambda Physik AG) ;
- Fechner, Burkhard (Lambda Physik AG)
- Published : 2005.07.19
Abstract
For creation of low temperature polycrystallinesilicon (LTPS) the line beam excimer laser annealing (ELA) is a well known and established technique in mass production. With introduction of Sequential Lateral Solidification (SLS) some aspects such as crystalline quality, throughput and flexibility regarding the substrate size could be improved, but for OLED manufacturing still further process development is necessary. This paper discusses line beam ELA and SLS techniques that might enable process engineers to make polycrystalline-silicon (poly-Si) films with a high degree of uniformity and quality as required for system on glass (SOG) and active matrix organic light emitting displays (AMOLED). Equipment requirements are discussed and compared to previous standards. SEM images of process examples are shown in order to demonstrate the viability.
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