Fabrication of a Nano Pattern Using Focused Ion Beam

집속이온빔을 이용한 나노 패턴 형성

  • Han J. (School of Mechanical Engineering, Yonsei University) ;
  • Min B.K. (School of Mechanical Engineering, Yonsei University) ;
  • Lee S.J. (School of Mechanical Engineering, Yonsei University) ;
  • Park C.W. (Department of Mechanical Engineering, Korea Polytechnic University) ;
  • Lee J.H. (Department of Mechanical Engineering, Korea Polytechnic University)
  • 한진 (연세대학교 기계공학부) ;
  • 민병권 (연세대학교 기계공학부) ;
  • 이상조 (연세대학교 기계공학부) ;
  • 박철우 (한국산업기술대학교 기계공학과) ;
  • 이종항 (한국산업기술대학교 기계공학과)
  • Published : 2005.06.01

Abstract

Nano pattern is being utilized to produce micro optical components, sensors, and information storage devices. In this study, a study on nano pattern fabrication using raster-scan type Focused Ion Beam (FIB) milling is introduced. Because the intensity of ion beam has Gaussian distribution, the overlapping of the Gaussian beam results in a 3D pattern, and the shape of the pattern can be adjusted by variation of FIB milling parameters, such as overlap, ion dose, and dwell time. The Gaussian shape of single beam intensity has been investigated by experiment, and 3D nano patterns with pitch of 200nm generated by FIB is demonstrated.

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