Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2005.11a
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- Pages.147-148
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- 2005
Adhesion and Recovery of Semiconductive Silicone Rubber by Oxygen Plasma Treatment
산소 플라즈마 처리된 반도전성 실리콘 고무의 회복현상 및 접착특성
- Lee, Ki-Taek (Inha Univ.) ;
- Hwang, Sun-Mook (Inha Univ.) ;
- Hong, Joo-Il (Inha Univ.) ;
- Seo, Yu-Jin (Inha Univ.) ;
- Hwang, Cheong-Ho (Inha Univ.) ;
- Huh, Chang-Su (Inha Univ.)
- Published : 2005.11.10
Abstract
In this work, recovery of semiconductive silicone rubber on oxygen plasma treatment was investigated in terms of X-ray photoelectron spectroscopy(XPS). The adhesion characteristics of semiconductive-insulating interface layer of silicone rubber were studied by measuring the T-peel strengths. As a result, surface methyl groups is removed and an oxidized layer containing Si atoms bound to 3 or 4 oxygens appears. The surface is later covered by a very thin layer due to migration of low-molecular-weight components from the bulk, resulting in decreasing the degree of adhesion of the semiconductive-insulating interface layer of silicone rubber these results are probably due to reorientation of polar groups or migration of low-molecular-weight.