한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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- Pages.59-60
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- 2005
Si 기판을 이용한 GaN 박막의 구조적 특성 연구
A Study of Structure Properties of GaN films on Si(111) by MOCVD
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Kim, Deok-Kyu
(Wonkwang Univ. School of Electrical Electronic and Information Engineering) ;
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Kim, Kyoung-Min
(Wonkwang Univ. School of Electrical Electronic and Information Engineering) ;
- Kim, Jin-Sa (Kwangwon Univ. School of Electrical Engineering) ;
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Park, Choon-Bae
(Wonkwang Univ. School of Electrical Electronic and Information Engineering)
- 발행 : 2005.11.10
초록
The characteristics of GaN epitaxial layers grown on silicon (111) substrates by metalorganic vapor phase epitaxy have been investigated. The only control of AIN thickness was found to decrease the stress sufficiently for avoiding crack formation in an overgrown thick (