Preparation of Al Thin Film with Magnetic Field Distribution

자계 분포 변화에 따른 OLED용 Al 박막의 제작

  • 김현웅 (경원대학교 전기공학과) ;
  • 조범진 (경원대학교 전기공학과) ;
  • 금민종 (경원대학교 전기공학과) ;
  • 김경환 (경원대학교 전기공학과)
  • Published : 2005.11.04

Abstract

The Al electrode for OLED was prepared by Facing Targets Sputtering(FTS) system which can reduce the damage of organic layer. The Al thin films were deposited on the cell (Lif/EML/HTL/Bottom electrode : ITO) for examination the current-voltage properties of OLED with magnetic field distribution between two faced targets. Thickness and current-voltage properties of Al thin films are measured by ${\alpha}-step$ and semiconductor parameter analyzer (HP4156A), respectively.

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