한국반도체및디스플레이장비학회:학술대회논문집 (Proceedings of the Korean Society Of Semiconductor Equipment Technology)
- 한국반도체및디스플레이장비학회 2005년도 추계 학술대회
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- Pages.147-150
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- 2005
Characteristics of hybrid mask mold for combined nanoimprint and photolithography technique
- MOON KANSHUN (Division of Materials Science and Engineering, Hanyang University) ;
- CHOI BANGLIM (Division of Materials Science and Engineering, Hanyang University) ;
- PARK IN-SUNG (Information Display Research Institute, Hanyang University) ;
- HONG SUNSHUM (Division Materials Science and Engineering, Koreas University) ;
- YANG KIHYUN (Division Materials Science and Engineering, Koreas University) ;
- LEE HEON (Division Materials Science and Engineering, Koreas University) ;
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AHN JINHO
(Division of Materials Science and Engineering, Hanyang University, Information Display Research Institute, Hanyang University)
- 발행 : 2005.09.01
초록
We process a novel approach cal led combined nanoimprint and photolithography (CNP) to greatly simplify the fabrication in conventional nanoimprint lithography (NIL). In this study, a novel HMM with anti-sticking
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