Proceedings of the Korean Magnestics Society Conference (한국자기학회:학술대회 개요집)
- 2005.12a
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- Pages.206-207
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- 2005
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- 2233-9485(pISSN)
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- 2233-9574(eISSN)
SUBSTRATE BIASED PLASMA ETCHING TECHNIQUE FOR FABRICATION OF SPINTRONIC DEVICES
- Lee K. I, (Department of Materials Science and Engineering, Yonsei University) ;
- Shim W. Y (Department of Materials Science and Engineering, Yonsei University) ;
- Chang J. Y. (Nano Device Research Center, Korea Institute of Science and Technology) ;
- Han S, H. (Nano Device Research Center, Korea Institute of Science and Technology) ;
- Shim K. H. (Nano Device Research Center, Korea Institute of Science and Technology) ;
- Lee W. Y. (Department of Materials Science and Engineering, Yonsei University)
- Published : 2005.12.01
Abstract
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