한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)

한국진공학회 (The Korean Vacuum Society)
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Effect of high-frequency variation on ArF PR deformation and silicon nitride etching by dual frequency superimposed (DFS) rf capacitive coupled plasma

  • Lee, N.E. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
  • Kim, D.H. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University)
  • 발행 : 2004.08.19
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