Proceedings of the KSME Conference (대한기계학회:학술대회논문집)
- 2004.11a
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- Pages.410-415
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- 2004
Molecular Dynamics Simulation of Deformation of Polymer Resist in Nanoimpirnt Lithography
나노임프린트 리소그래피에서의 폴리머 레지스트의 변형에 관한 분자 동역학 시뮬레이션
- Published : 2004.11.03
Abstract
Molecular dynamics simulations of nanoimprint lithography in which a stamp with patterns is pressed onto amorphous poly-(methylmethacrylate) (PMMA) surface are performed to study the deformation of polymer. Force fields including bond, angle, torsion, inversion, van der Waals and electrostatic potential are used to describe the intermolecular and intramolecular force of PMMA molecules and stamp. Periodic boundary condition is used in horizontal direction and
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