대한기계학회:학술대회논문집 (Proceedings of the KSME Conference)
- 대한기계학회 2004년도 춘계학술대회
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- Pages.1475-1480
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- 2004
CVD 반응기 내에서의 유동장에 대한 샤워헤드 지름의 영향에 대한 수치적 연구
EFFECTS OF SHOWERHEAD DIAMETERS ON THE FLOWFIELDS IN A RF-PECVD REACTOR
초록
Plasma Enhanced Chemical Vapor Deposition (PECVD) process uses unique property of plasma to modify surfaces and to achieve the high deposition rates. In this study, a vertical thermal RF-PECVD (Radio Frequency-PECVD) reactor is modeled to investigate thermal flow and the deposition rates with various shapes of the showerhead. The showerhead in the CVD reactor has the shape of a ring and gases are injected in parallel with the susceptor, which is a rotating disk. In order to achieve the high deposition rates, we have simulated the thermal flow fields in the reactor with several showerhead models. Especially the effects of the number of injection holes and the rotating speed of the susceptor are studied. Using a commercial code, CFDACE, which uses FVM (Finite Volume Method) and SIMPLE algorithm, governing equations have been solved for the pressure, mass-flow rates and temperature distributions in the CVD reactor. With the help of the Nusselt number and Sherwood number, the heat and mass transfers on the susceptor are investigated. In order to characteristics of measure the flatness of the layer, furthermore, the relative growth rate (RGR) is considered.
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