한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2004년도 춘계학술대회 논문집 디스플레이 광소자분야
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- Pages.142-145
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- 2004
RTP 와 PECVD을 이용한 저가의 표면 passivation 막들의 특성연구
Cost-effective surface passication layers by RTP and PECVD
- Lee, Ji-Youn (Photovoltaics R&D Center, Sungjin Semitech Co.) ;
- Lee, Soo-Hong (Strategic Research Energy Center, Dept. of Electronics Engineering, Sejong University)
- 발행 : 2004.05.06
초록
In this work, we have investigated the application of rapid thermal processing (RTP) and plasma enhanced chemical vapour deposition (PECVD) for surface passivation. Rapid thermal oxidation (RTO) has sufficiently low surface recombination velocities (SRV)