한국정보디스플레이학회:학술대회논문집
- 2004.08a
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- Pages.319-321
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- 2004
New Technology for Creation of LTPS with Excimer Laser Annealing
- Herbst, Ludolf (Lambda Physik AG) ;
- Simon, Frank (MicroLas GmbH) ;
- Rebhan, Ulrich (Lambda Physik AG) ;
- Osmanow, Rustem (Lambda Physik AG) ;
- Fechner, Burkhard (Lambda Physik AG)
- Published : 2004.08.23
Abstract
We report on progress in developing high-power excimer lasers as well as UV-optics for creating low-temperature poly silicon (LTPS). A new high-power excimer laser offers 315 Watts with high pulse to pulse energy stability. Larger substrates can now be processed in better quality with either the SLS process or the new optics for line beam excimer laser annealing.
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