Atomic Layer Deposition of $Bi_2Ti_2O_7$ Thin Films for Capacitor Dielectric Applications

  • Hwang Gyu Weon (School of Materials Sciences and Engineering, Seoul National University) ;
  • Kim Wan Don (School of Materials Sciences and Engineering, Seoul National University) ;
  • Hwang Cheol Seong (School of Materials Sciences and Engineering, Seoul National University) ;
  • Min Yo-Sep (Materials & Devices Lab, Samsung Advanced Institute of Technology) ;
  • Cho Young Jin (Materials & Devices Lab, Samsung Advanced Institute of Technology) ;
  • Han Jeong-Hee (Materials & Devices Lab, Samsung Advanced Institute of Technology)
  • Published : 2004.10.01