Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2004.07a
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- Pages.173-176
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- 2004
Optical properties of nanocrystalline silicon thin films depending on deposition parameters
박막증착조건 변화에 따른 실리콘 나노결정 박막의 광학적 특성
- Kim, Gun-Hee (Yonsei University) ;
- Kim, Jong-Hoon (Yonsei University) ;
- Jeon, Kyung-Ah (Yonsei University) ;
- Lee, Sang-Yeol (Yonsei University)
- Published : 2004.07.05
Abstract
Silicon thin films on p-type(100) silicon substrate have been prepared by a pulsed laser deposition(PLD) technique using a Nd:YAG laser. The pressure of the environmental gas during deposition was 1 Torr. After deposition, silicon thin film has been annealed in nitrogen ambient. Strong blue photoluminescence(PL) has been observed at room temperature. We report the optical properties of silicon thin films with the variation of the deposition parameters.