한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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- Pages.48-51
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- 2004
The Effect of Re-nitridation on Plasma-Enhanced Chemical-Vapor Deposited $SiO_2/Thermally-Nitrided\;SiO_2$ Stacks on N-type 4H SiC
- Cheong, Kuan Yew (Power Semiconductor Research Group, Korea Electrotechnology Research Institute(KERI)) ;
- Bahng, Wook (Power Semiconductor Research Group, Korea Electrotechnology Research Institute(KERI)) ;
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Kim, Nam-Kyun
(Power Semiconductor Research Group, Korea Electrotechnology Research Institute(KERI)) ;
- Na, Hoon-Ju (Materials Science Division, Seoul National University)
- 발행 : 2004.07.05
초록
In this paper the importance of re-nitridation on a plasma-enhanced chemical-vapor deposited(PECVD)