Electrical and Magnetic Properties of Cr-doped ZnO:Al Thin Films grown by Reactive Sputtering

반응성 스퍼터링으로 제조한 크롬이 첨가된 ZnO:Al 박막의 전${\cdot}$자기적 특성

  • KIM Hyun Jung (Dept. of Materials Science and Engineering, KAIST) ;
  • SIM Jae Ho (Dept. of Materials Science and Engineering, Chungnam National University) ;
  • KIM Hyojin (Dept. of Materials Science and Engineering, Chungnam National University) ;
  • KIM Dojin (Dept. of Materials Science and Engineering, Chungnam National University) ;
  • IHM Young Eon (Dept. of Materials Science and Engineering, Chungnam National University) ;
  • CHOO Woong Kil (Dept. of Materials Science and Engineering, KAIST)
  • 김현중 (한국과학기술원 신소재공학과) ;
  • 심재호 (충남대학교 재료공학과) ;
  • 김효진 (충남대학교 재료공학과) ;
  • 김도진 (충남대학교 재료공학과) ;
  • 임영언 (충남대학교 재료공학과) ;
  • 주웅길 (한국과학기술원 신소재공학과)
  • Published : 2004.06.01