Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2004.07c
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- Pages.1874-1875
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- 2004
A sputtering technique of magnesium oxide thin film in oxide mode for plasma display panel
Plasma Display Panel용 산화마그네슘 박막의 산화영역에서의 스퍼터 성막기술
- Choi, Young-Wook (Korea Electrotechnology Research Institute) ;
- Kim, Jee-Hyun (Korea Electrotechnology Research Institute)
- Published : 2004.07.14
Abstract
A high rate deposition sputtering process of magnesium oxide thin film in oxide mode has been developed using a 20 kW unipolar pulsed power supply. The powersupply was operated at a maximum constant voltage of 500 V and a constant current of 40 A. The pulse repetition rate and the duty were changed in the ranges of 10
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