Proceedings of the Korean Ceranic Society Conference (한국세라믹학회:학술대회논문집)
- 2003.10a
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- Pages.146.2-146
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- 2003
The Effect of RF Bias Power on the $SiO_2$ and SiON Thick Film Deposited by PECVD
PECVD법에 의해 증착된 $SiO_2$ 와 SiON 후막의 RF Bias power의 영향
- Published : 2003.10.17
Abstract
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